Computational lithography and mask optimization techniques are at the forefront of enabling the semiconductor industry's continued miniaturisation of integrated circuits. This field encompasses ...

A new technical paper titled “Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types” was published by Hanyang University and Paul Scherrer ...

Figure 1. Comparison between conventional imaging using an imaging system (left) and “diffractive imaging” (right). In both cases, the sample needs to be illuminated by EUV light. However, the ...

AUSTIN, Texas — Motorola researchers said they are on track to develop the masks needed for extreme ultraviolet (EUV) lithography, which is expected to enter manufacturing at the 50-nanometer ...

Fig. 1 The lithography process. The projection lithography system. The advancement of semiconductor manufacturing is a key driver of electronic device innovations. As Moore’s Law progresses, ...

Researchers review AI-powered inverse lithography, showing how deep learning boosts chip patterning precision and efficiency while facing scaling challenges. Computational lithography optimizes the ...

The European Mask and Lithography Conference (EMLC) 2024 recently was held in Grenoble, France, and had about 190 participants from a wide range of companies and institutions. Being relatively new to ...

Computer chips are undoubtedly one the great wonders of the modern world, incredible feats of engineering. And just when you thought they couldn't get any more complex and intriguing, here comes ...

(Nanowerk News) Researchers have developed a process to turn crab shells into a bioplastic that can be used to make optical components known as diffraction gratings. The resulting lightweight, ...

Invented 20 years ago, nanoimprint lithography offers a powerful manufacturing alternative for the semiconductor and other nanotechnology sectors, says Helmut Schift Pressing matter A technician from ...